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 > tioLogic® implants

Integrated platform-focussing

Improved aesthetics

The cervical chamfer of the implant shoulder in a tioLogic© implant takes into account the biological width. The combination of cervical chamfer, crestal fine thread and CBS surface, which extends right to the cervical chamfer, promotes the apposition of bone tissue, prevents bone collapse and reduces gingival recession.

Fine thread

Increased stability in the compact bone

The crestal fine-pitch thread of the tioLogic© implant is ideally tailored to the density of the cortical bone and ensures high primary stability, even with poor horizontal bone availability.

Coarse thread

Increased stability in the spongiosa bone

The progressive coarse-pitch thread is tailored to the density of the spongiosa bone and provides high primary stability, even with unfavourable bone conditions. It also guarantees perfect placement of the tioLogic© implant.

Rounded apex

Increased safety during sinus lift

The clinically proven external geometry of the tioLogic© implant, which is similar to the shape of a root, ensures ideal physiological load distribution that produces minimum stress on the bone and also contributes to improved primary and secondary stability. The rounded apex prevents damage to anatomical structures (sinus floor) during insertion.

Thread geometry

Optimal load distribution

The design detail of the thread flanks and the contour of the thread depth and pitch of the tioLogic© implant have been developed to provide optimal load distribution. This thread design prevents strain or stress peaks in the bone.


Diameters and lengths (in mm)

ø 3,3 3,7 4,2 4,8 5,5
length x 9 9 9 9
length 11 11 11 11 11
length 13 13 13 15 13
length 15 15 15 15 15
length 17 17 17 17 x

CBS technology

Improved osseointegration

The implant surface has been conditioned in the endosseous region using CBS (ceramic blasted surface) technology so that it optimally resembles the cellular bone structure. This enables rapid, direct apposition of bone tissue and ensures optimum osseointegration of the tioLogic© implant.

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