The cervical chamfer of the implant shoulder in a tioLogic® ST implant takes into account the biological width. The combination of cervical chamfer, crestal fine thread and etched/blasted surface, which extends right to the cervical chamfer, promotes the apposition of bone tissue, prevents bone collapse and reduces gingival recession.
Increased stability in the compact bone
The crestal fine-pitch thread of the tioLogic© implant is ideally tailored to the density of the cortical bone and ensures high primary stability, even with poor horizontal bone availability.
Increased stability in the spongiosa bone
The modified self-tapping thread geometry of the tioLogic® ST implant in combination with the reduced thread pitch enables quick, atraumatic implant placement with a constant insertion torque and high primary stability. It also guarantees perfect placement of the tioLogic® ST implant.
Increased safety during sinus lift
The clinically proven external geometry of the tioLogic® ST implant, which is similar to the shape of a root, ensures ideal physiological load distribution that produces minimum stress on the bone and also contributes to improved primary and secondary stability. The rounded apex prevents damage to anatomical structures (sinus floor) during insertion.
Optimal load distribution
The design detail of the thread flanks and the patented macro and micro design of the tioLogic® implant have been developed to provide optimal load distribution. This thread design prevents strain or stress peaks in the bone.
Diameters and lengths
The implant surface has been blasted and etched twice in the endosseous region so that it optimally resembles the cellular bone structure. This enables rapid, direct apposition of bone tissue and ensures optimum osseointegration of the tioLogic® ST implant.